Photolithography method

A photolithography method, comprising:

• sequentially preparing, on a surface of a photolithography substrate, a functional film layer, a reflective auxiliary imaging film layer and a first photoresist layer which are stacked;
• performing photolithography on the first photoresist layer to obtain a first photolithography structure;
• etching the reflective auxiliary imaging film layer with the first photolithography structure as a masking layer, to transfer a pattern of the first photolithography structure to the reflective auxiliary imaging film layer;
• sequentially preparing, on the pattern of the reflective auxiliary imaging film layer, a second photoresist layer and a transmissive auxiliary imaging film layer which are stacked;
• performing surface plasmon photolithography with the pattern of the reflective auxiliary imaging film layer as a mask, removing the transmissive auxiliary imaging film layer and developing the second photoresist layer to obtain a second photolithography structure, wherein the surface plasmon photolithography is controlled by a cavity between the transmissive auxiliary imaging film layer and the patterned reflective auxiliary imaging film layer;
• and
• etching the functional film layer with the second photolithography structure as a masking layer, to transfer a pattern of the second photolithography structure to the functional film layer to obtain a third photolithography structure.