Mask synthesis using tensor-based computing platforms

A system comprising:

• a memory storing instructions;
• and
• a tensor-based computing platform, coupled with the memory and to execute the instructions, the instructions when executed cause the tensor-based computing platform to:
• execute a sequence of at least two forward models to estimate a printed pattern resulting from use of a lithographic mask in a lithographic process, wherein a first of the forward models uses a layout of the lithographic mask as input and a last of the forward models produces the estimated printed pattern as output;
• and
• execute a mask synthesis model to modify the layout of the lithographic mask based on differences between the estimated printed pattern and a target printed pattern;
• wherein the mask synthesis model includes a deep neural network followed by a shallow neural network, the deep neural network has more hidden layers than the shallow neural network, and the shallow neural network is pattern specific and has not more than two hidden layers.

A non-transitory computer readable medium comprising stored instructions, which when executed by a processor, cause the processor to:

• access a layout of a lithographic mask;
• estimate a printed pattern resulting from use of the lithographic mask in a lithographic process, wherein the lithographic process is modeled by a sequence of at least two forward models, a first of the forward models using the layout of the lithographic mask as input and a last of the forward models producing the estimated printed pattern as output;
• and
• execute a mask synthesis model to modify the layout of the lithographic mask based on differences between the estimated printed pattern and a target printed pattern, wherein the mask synthesis model includes a deep neural network followed by a shallow neural network, the deep neural network has more hidden layers than the shallow neural network, and the shallow neural network is pattern specific and has not more than two hidden layers;
• wherein all of the forward models and the mask synthesis model use tensor multiplications and tensor operations.