Plating apparatus

A plating apparatus comprising:

• a plating tank configured to accumulate a plating solution and include an anode arranged inside the plating tank;
• a substrate holder arranged above the anode and configured to hold a substrate as a cathode;
• a rotation mechanism arranged above the substrate holder, the rotation mechanism including a rotation shaft for connecting to the substrate holder and a bearing pivotally supporting the rotation shaft;
• a labyrinth seal member that includes:
• an inner labyrinth seal arranged below the bearing to seal the bearing;
• an outer labyrinth seal arranged outside in a radial direction of the rotation shaft with respect to the inner labyrinth seal;
• a delivery port configured to supply air to an inner seal space formed inside in the radial direction with respect to the inner labyrinth seal;
• and
• a suction port configured to suction air in an outer seal space formed outside in the radial direction with respect to the inner labyrinth seal and inside in the radial direction with respect to the outer labyrinth seal;
• and
• a control module configured to perform control processing of supplying air from the delivery port and suctioning air from the suction port at least in a case where the rotation mechanism rotates the rotation shaft.