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US 12,180,589 B2Granted
Showerhead for process tool
AssigneeTokyo Electron Limited
InventorAnthony Dip
Life of this patent
Estimating the term…
Abstract
In one example, an apparatus includes a processing chamber; a substrate holder disposed in the processing chamber; and a showerhead disposed over the substrate holder. The showerhead includes a first zone disposed in a central region of the showerhead, the first zone including a first cavity, a plurality of first fluid exit holes aligned to output a fluid from the first cavity towards the substrate holder, a first flow path fluidly coupled to a fluid source, and a plurality of first fluid distribution pathways fluidly coupling the first flow path with the first cavity.
Claims24
An apparatus comprising:
- a processing chamber;
- a substrate holder disposed in the processing chamber;
- and
- a showerhead disposed over the substrate holder, the showerhead comprising a first zone disposed in a central region of the showerhead, the first zone comprising a first cavity, a plurality of first fluid exit holes aligned to output a fluid from the first cavity towards the substrate holder, a first flow path fluidly coupled to a first fluid source, and a plurality of first fluid distribution pathways fluidly coupling the first flow path with the first cavity, each of the first fluid distribution pathways comprising a mini cavity for storing the fluid, wherein the mini cavities are arranged in a first section oriented in a first direction and a second section oriented in a second direction, the second direction being orthogonal to the first section, the first section and the second section forming a warped cross shape in a top view.
1 more element
An apparatus comprising:
- a processing chamber;
- a substrate holder disposed in the process chamber, the substrate holder being configured to support a plurality of wafers;
- and
- a showerhead system disposed over the substrate holder, the showerhead system comprising:
- a wedge-shaped showerhead disposed around a central region of the processing chamber, the wedge-shaped showerhead comprising:
- a first cavity in a central zone of the wedge-shaped showerhead,
- a plurality of first fluid exit holes aligned to output a fluid from the first cavity towards the substrate holder,
- a plurality of fluid distribution pathways exiting into the first cavity, each of the plurality of fluid distribution pathways comprising a respective mini cavity for storing the fluid, wherein the respective mini cavities are arranged in a first section oriented in a first direction and a second section oriented in a second direction, the second direction being orthogonal to the first section, the first section and the second section forming a warped cross shape in a top view, and
- a first flow path fluidly coupling a first fluid source with the plurality of fluid distribution pathways.
6 more elements
An apparatus comprising:
- a processing chamber;
- a substrate holder disposed in the processing chamber;
- and
- a showerhead disposed over the substrate holder, the showerhead comprising
- a first flow path fluidly coupled to a first fluid source holding a first fluid,
- a first plurality of mini cavities, each of the first plurality of mini cavities fluidly coupled to the first fluid source through the first flow path and configured to store the first fluid, the first plurality of mini cavities comprising a first section oriented in a first direction and a second section oriented in a second direction, the second direction being orthogonal to the first section, the first section and the second section forming a warped cross shape in a top view,
- a first cavity, each of the first plurality of mini cavities comprising one of a first plurality of fluid distribution holes to output the first fluid into the first cavity, and
- a plurality of first fluid exit holes aligned to output the first fluid from the first cavity towards the substrate holder.
5 more elements
Dependencies are inferred from the claim text.