Vacuum chamber and arrangement for atomic layer deposition

An arrangement for comprising:

• a vacuum chamber provided with a loading opening and a back wall opposite the loading wall, and a first direction extending between the loading wall and the back wall, and
• a movable reaction chamber,
• wherein:
• the vacuum chamber comprises:
• a vacuum chamber gas connection arrangement provided inside the vacuum chamber and comprising a first contact surface, a fixed gas manifold, and a flexible outer flange assembly surrounding the fixed gas manifold, the flexible outer flange assembly is arranged flexible in a vertical direction;
• a first vacuum chamber support rail arranged inside the vacuum chamber and extending in the first direction;
• and
• the movable reaction chamber comprises:
• a first reaction chamber support track extending in the first direction and arranged to be supported by the first vacuum chamber support rail,
• a reaction chamber gas connection arrangement provided with a second contact surface, the first contact surface of the vacuum chamber gas connection arrangement and the second contact surface of the reaction chamber gas connection arrangement are arranged to connect to each other in the vertical direction for providing a gas coupling upon moving the first vacuum chamber support rail in the vertical direction;
• and
• the first vacuum chamber support rail is configured to be moved in the vertical direction with respect to the vacuum chamber.

A vacuum chamber, comprising:

• a loading wall provided with a loading opening, a back wall opposite the loading wall, and a first direction extending between the loading wall and the back wall;
• one or more side walls extending between the loading wall and the back wall, the one or more side walls defining a vacuum chamber space inside the vacuum chamber;
• a first vacuum chamber support rail disposed inside the vacuum chamber and extending in the first direction, the first vacuum chamber support rail configured to be moved in a vertical direction with respect to the vacuum chamber;
• and
• a vacuum chamber gas connection arrangement for providing a gas coupling to a movable reaction chamber, the vacuum chamber gas connection arrangement includes a fixed gas manifold and a flexible outer flange assembly surrounding the fixed gas manifold, the flexible outer flange assembly is arranged flexible in the vertical direction and comprises a first connection surface for providing the gas coupling to the movable reaction chamber.