Method for producing halide
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsTakashi Kubo, Kazufumi Miyatake, Keita Mizuno, Tetsuya Asano, Akihiro Sakai
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AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsTakashi Kubo, Kazufumi Miyatake, Keita Mizuno, Tetsuya Asano, Akihiro Sakai
Estimating the term…
The production method of the present disclosure includes heat-treating a material mixture containing a compound containing Y, a compound containing Sm, NH4α, Liβ, and Caγ2 in an inert gas atmosphere. The compound containing Y is at least one selected from the group consisting of Y2O3 and Yδ3, and the compound containing Sm is at least one selected from the group consisting of Sm2O3 and Smε3. The material mixture contains at least one selected from the group consisting of Y2O3 and Sm2O3, and α, β, γ, δ, and ε are each independently at least one selected from the group consisting of F, Cl, Br, and I.
A method for producing a halide, the method comprising:
Dependencies are inferred from the claim text.