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US 12,172,170 B2Granted
Method for producing silicon fragments
AssigneeWacker Chemie AG
InventorMatthias Vietz
Life of this patent
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Abstract
The present disclosure relates to a method for producing polycrystalline silicon fragments. The process includes (a) providing a polycrystalline silicon rod, (b) working the surface of the silicon rod by means of a hammer or needle hammer to remove at least a portion of a layer of the surface of the polycrystalline silicon rod, and (c) reducing the silicon rod to fragments. Wherein an amount of impact energy expended by the hammer and/or needle hammer is from 1 J to 15 J.
Claims13
A process for producing silicon chunks, comprising the steps of:
- a) providing a silicon rod;
- b) treating a surface of the silicon rod with a hammer and/or a needle hammer for at least partial removal of a silicon layer of the surface of the silicon rod;
- c) comminuting the silicon rod into chunks using a thermal crushing process or a high-voltage impulse crushing or a jaw crusher, a roller crusher, a chisel or a sledgehammer apparatus;
- and
- wherein the silicon layer of the surface of the silicon rod is removed to a depth of 1 to 10 mm by an impact energy applied with the hammer and/or needle hammer of 1 to 15 J.
2 more elements
Dependencies are inferred from the claim text.