Method for preparing high-resolution quantum dot (QD) pixelated light-emitting film

Abstract

The invention provides a high-resolution QD pixelated light-emitting film and method for preparing same. The method includes: spin-coating a photoresist on a base; drying and exposing the base; coating a developer at a preset position on the base to obtain a photoresist pattern layer; depositing an insulating layer on the photoresist pattern layer by using silane; removing a photoresist pattern in the insulating layer; spin-coating a polyethylenimine solution on the insulating layer to obtain a PEI layer; and dropping a QD solution on the PEI layer to deposit a QD layer. The hydrophobicity of silane is used to implement dewetting to implement QD pixilation. A PEI solution is spontaneously deposited at the position of a photoresist pattern. Further, the QD solution is adsorbed into the PEI solution to obtain a high-resolution QD pixelated light-emitting film, thereby improving the film forming quality, and passivating surface defects of a QD layer.

Dependencies are inferred from the claim text.