Transparent conductive film
AssigneeBASF Coatings GmbH
InventorsBoram Cho, Jean-Charles Flores, Michael Reinke, Myung Mo Sung, Jin Won Jung
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Abstract
Described herein is a transparent conductive film including (a) a first laminate including at least two layers containing TiO2, ZrO2 or HfO2, and a layer containing an organic compound in between the two layers containing TiO2, ZrO2 or HfO2, (b) a metal layer, and (c) a second laminate including at least two layers containing ZnO, a layer containing an organic compound between the two layers containing ZnO, and a metallic dopant other than zinc.
Claims12
A transparent conductive film comprising
- (a) a first laminate comprising
- at least two layers containing TiO2, ZrO2 or HfO2, and
- a layer containing a sulfur-containing organic compound in between the two layers containing TiO2, ZrO2 or HfO2,
- wherein each layer containing a sulfur-containing organic compound is in between two layers containing TiO2, ZrO2 or HfO2,
- wherein the layers containing TiO2, ZrO2 or HfO2 each have a thickness of 0.1 to 5 nm,
- (b) a metal layer, and
- (c) a second laminate comprising
- at least two layers containing ZnO,
- a layer containing a sulfur-containing organic compound between the two layers containing ZnO, and
- a metallic dopant other than zinc,
- wherein each layer containing a sulfur-containing organic compound is in between two layers containing ZnO,
- wherein the layers containing ZnO each have a thickness of 0.1 to 5 nm,
- wherein the metal layer is between the first and the second laminate;
- wherein a sheet resistance of the film increases by less than 10% after bending the film for 500 times around a radius of 1 cm.
A process for preparing a transparent conductive film comprising depositing on a substrate
- (a) a first laminate comprising
- at least two layers containing TiO2, ZrO2 or HfO2, and
- a layer containing a sulfur-containing organic compound in between the two layers containing TiO2, ZrO2 or HfO2,
- wherein each layer containing a sulfur-containing organic compound is in between two layers containing TiO2, ZrO2 or HfO2,
- wherein the layers containing TiO2, ZrO2 or HfO2 each have a thickness of 0.1 to 5 nm,
- (b) a metal layer, and
- (c) a second laminate comprising
- at least two layers containing ZnO,
- wherein the layers containing ZnO each have a thickness of 0.1 to 5 nm,
- a layer containing a sulfur-containing organic compound between the two layers containing ZnO, and
- a metallic dopant other than zinc,
- wherein each layer containing a sulfur-containing organic compound is in between two layers containing ZnO,
- wherein the metal layer is between the first and the second laminate;
- wherein a sheet resistance of the film increases by less than 10% after bending the film for 500 times around a radius of 1 cm.
Dependencies are inferred from the claim text.