Antenna including at least one microstrip line phase shifting unit having a photo-dielectric layer and a light guiding structure configured to guide light into the photo-dielectric layer

A preparation method of a phase shifter comprising:

• providing a photo-dielectric layer;
• and
• preparing a microstrip line on a side of the photo-dielectric layer, preparing a ground electrode on a side of the photo-dielectric layer facing away from the microstrip line, and preparing at least one light guiding structure to form at least one phase shifting unit, wherein the at least one light guiding structure at least partially overlaps the photo-dielectric layer,
• wherein before preparing the at least one light guiding structure, the method further comprises:
• providing a first substrate, wherein the first substrate comprises a first sub-substrate and a second sub-substrate;
• and
• wherein preparing the at least one light guiding structure comprises:
• preparing a groove on a side of the first sub-substrate, and preparing a first metal reflective layer on a side of the groove;
• etching the first metal reflective layer to form a light output opening;
• preparing a second metal reflective layer on a side of the second sub-substrate;
• and
• bonding the first sub-substrate and the second sub-substrate to form the at least one light guiding structure in the first substrate.

An antenna comprising a phase shifter, wherein the phase shifter comprises:

• at least one phase shifting unit, wherein each phase shifting unit of the at least one phase shifting unit comprises a microstrip line, a photo-dielectric layer, a ground electrode, and at least one light guiding structure,
• wherein the microstrip line is located on a side of the photo-dielectric layer, and the ground electrode is located on a side of the photo-dielectric layer facing away from the microstrip line;
• and
• the at least one light guiding structure at least partially overlaps the photo-dielectric layer, and the at least one light guiding structure is configured to guide light into the photo-dielectric layer,
• wherein each light guiding structure of the at least one light guiding structure comprises a light output opening, and a vertical projection of the light output opening on a plane where the microstrip line is located does not overlap the microstrip line, and
• wherein along a direction parallel to a plane where the photo-dielectric layer is located, the light output opening comprises a first boundary, and the first boundary is a boundary of a side of the light output opening facing the microstrip line;
• the microstrip line comprises a second boundary, the second boundary is a boundary of a side of the microstrip line facing the light output opening, and a shortest distance between the first boundary and the second boundary is D1, wherein 0<D1≤2 mm.