Semiconductor device and manufacturing method for the same

A semiconductor device comprising:

• a trimming element buried in or provided over a semiconductor substrate;
• an insulating film provided on the trimming element;
• a first wiring layer provided on the insulating film and connected to one end of the trimming element via a first contact region penetrating the insulating film;
• a second wiring layer provided on the insulating film and connected to another end of the trimming element via a second contact region penetrating the insulating film;
• and
• an auxiliary wiring layer provided on the insulating film, at a position overlapping with a middle part provided between the one end and the other end of the trimming element in a first direction and separated from the first wiring layer and the second wiring layer, and connected to only one electrode pad, the auxiliary wiring layer for examination of an insulated state of the insulating film between the auxiliary wiring layer and the trimming element to determine whether current flows between the second wiring layer and the auxiliary wiring layer when voltage is applied between the second wiring layer and the auxiliary wiring layer,
• wherein
• the insulated state between the auxiliary wiring layer and either the first wiring layer or the second wiring layer is examined after trimming of the trimming element,
• the trimming element is a fusible resistor provided over the semiconductor substrate via an insulating film, and the middle part has a narrower width than the one end and the other end in a second direction orthogonal to the first direction.

A semiconductor device comprising:

• a trimming element buried in or provided over a semiconductor substrate;
• an insulating film provided on the trimming element;
• a first wiring layer provided on the insulating film and connected to one end of the trimming element via a first contact region penetrating the insulating film;
• a second wiring layer provided on the insulating film and connected to another end of the trimming element via a second contact region penetrating the insulating film;
• and
• an auxiliary wiring layer provided on the insulating film at a position overlapping with a middle part of the trimming element,
• wherein the middle part is provided between the one end and the other end in a first direction,
• the first wiring layer, second wiring layer and the auxiliary wiring layer are in contact with a top surface of the insulating film,
• a thickness of the insulating film between the trimming element and each of the first wiring layer and the second wiring later is equal to a thickness of the insulating film between the auxiliary wiring layer and the trimming element, and
• the auxiliary wiring layer for examination of an insulated state of the insulating film between the auxiliary wiring layer and the trimming element to determine whether current flows between the second wiring layer and the auxiliary wiring layer when voltage is applied between the second wiring layer and the auxiliary wiring layer,
• wherein
• the insulated state between the auxiliary wiring layer and either the first wiring layer or the second wiring layer is examined after trimming of the trimming element,
• the trimming element is a fusible resistor provided over the semiconductor substrate via an insulating film, and
• the middle part has a narrower width than the one end and the other end in a second direction orthogonal to the first direction.