Semiconductor manufacturing apparatus

A semiconductor manufacturing apparatus comprising:

• a rotation stage that rotates a wafer;
• a nozzle that supplies a chemical solution to a processing surface of the wafer;
• a nozzle mover that moves the nozzle on such a scan trajectory as to cross the processing surface in a planar view above the processing surface;
• and
• a controller configured to control movement of the nozzle mover, wherein
• the nozzle mover is controlled by the controller which is configured to move the nozzle along at least one first trajectory and at least one second trajectory on the scan trajectory so that the wafer is etched with the chemical solution,
• the at least one first trajectory is a trajectory to turn around at a first turnaround point on one side and a second turnaround point on the other side with respect to a portion closest to a rotation axis of the rotation stage in the scan trajectory, and
• the at least one second trajectory is a trajectory to turn around at a third turnaround point on the scan trajectory and a fourth turnaround point provided on the same side as the third turnaround point with respect to the portion closest to the rotation axis in the scan trajectory.