Film processing method

A film processing method comprising:

• discharging a metal-containing coating liquid including a metal component and a coating liquid from a processing liquid nozzle to a surface to be processed of a substrate at a process position above the substrate;
• moving the processing liquid nozzle between the process position and a cleaning position farther outward than the substrate by a mover:
• storing at least part of the processing liquid nozzle in a storage provided at the cleaning position;
• discharging a first removal liquid for dissolving the metal component included in the metal-containing coating liquid through a first flow path and a first opening that are formed in the storage to an outer surface of the processing liquid nozzle in the storage by a first removal liquid supplier connected to the first flow path, the first flow path being directed to the outer surface of the processing liquid nozzle, the first opening being formed to be opposite to the outer surface of the processing liquid nozzle in the storage;
• discharging pure water through a second flow path and a second opening that are formed in the storage to the outer surface of the processing liquid nozzle in the storage by a pure water supplier connected to the second flow path, the second flow path being located at a position farther upward than the first flow path and directed to the outer surface of the processing liquid nozzle in the storage, the second opening being formed to be opposite to the outer surface of the processing liquid nozzle in the storage and to be located at a position farther upward than the first opening;
• and
• holding and rotating the substrate in a horizontal attitude by a rotation holder,
• wherein the discharging a metal-containing coating liquid includes forming a metal-containing coating film on the surface to be processed of the substrate by discharging the metal-containing coating liquid from the processing liquid nozzle to the surface to be processed of the substrate rotated by the rotation holder,
• the third removal liquid includes a fourth removal liquid for dissolving the metal component and a fifth removal liquid for dissolving the coating liquid, and
• the supplying a third removal liquid includes supplying the fourth and fifth removal liquids to the peripheral portion of the surface to be processed of the substrate by one or a plurality of removal liquid nozzles of the peripheral portion removal liquid supply unit.