Unit for supplying substrate treating liquid and apparatus for treating substrate including the same

A unit for supplying a substrate-treating liquid, the unit comprising:

• a supply reservoir module comprising:
• a first reservoir configured to supply the substrate-treating liquid to an inkjet head unit configured to jet the substrate-treating liquid onto a substrate, and
• a second reservoir configured to recover the substrate-treating liquid that remains unused in the inkjet head unit;
• a buffer reservoir module configured to provide the substrate-treating liquid to the first reservoir;
• a circulation control module configured to cause the substrate-treating liquid recovered to the second reservoir to be circulated and re-supplied to the first reservoir;
• a first line connecting the first reservoir and the inkjet head unit;
• a second line connecting the inkjet head unit and the second reservoir;
• and
• a third line connecting the first reservoir and the second reservoir,
• wherein the third line is configured to move a flow rate corresponding to a differential pressure between the first reservoir and the second reservoir, and
• wherein a flow rate of the substrate-treating liquid passing through the third line is greater than a flow rate of the substrate-treating liquid passing through the first line and/or the second line.

An apparatus for treating a substrate, comprising:

• an inkjet head unit configured to jet a substrate-treating liquid onto the substrate;
• and
• a unit for supplying the substrate-treating liquid to the inkjet head unit,
• wherein the unit for supplying the substrate-treating liquid comprises:
• a supply reservoir module comprising:
• a first reservoir configured to supply the substrate-treating liquid to the inkjet head unit, and
• a second reservoir configured to recover the substrate-treating liquid that remains unused in the inkjet head unit, and
• a buffer reservoir module configured to provide the substrate-treating liquid to the first reservoir;
• and
• a circulation control module configured to circulate and re-supply the substrate-treating liquid from the second reservoir to the first reservoir,
• wherein a differential pressure is constantly maintained between the first reservoir and the second reservoir, and
• wherein the unit for supplying the substrate-treating liquid further comprises:
• a first line connecting the first reservoir and the inkjet head unit;
• a second line connecting the inkjet head unit and the second reservoir;
• a third line connecting the first reservoir and the second reservoir;
• a fourth line separate from the second line and connected between the second reservoir and the circulation control module;
• and
• a fifth line separate from the first line and connected between the circulation control module and the first reservoir.