Sacrificial protection layer for environmentally sensitive surfaces of substrates
AssigneeLam Research Corporation
InventorsStephen M. Sirard, Ratchana Limary, Yang Pan, Diane Hymes
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AssigneeLam Research Corporation
InventorsStephen M. Sirard, Ratchana Limary, Yang Pan, Diane Hymes
Estimating the term…
A method for protecting a surface of a substrate during processing includes a) providing a solution forming a co-polymer having a ceiling temperature; b) dispensing the solution onto a surface of the substrate to form a sacrificial protective layer, wherein the co-polymer is kinetically trapped to allow storage at a temperature above the ceiling temperature; c) exposing the substrate to ambient conditions for a predetermined period; and d) de-polymerizing the sacrificial protective layer by using stimuli selected from a group consisting of ultraviolet (UV) light and heat.
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Dependencies are inferred from the claim text.