Mechanism for adjusting angle of incidence on charged particle beam aperture, and charged particle beam device

A charged particle beam device comprising:

• a charged particle beam source that generates a charged particle beam;
• a first charged particle beam electrode having an annular slit;
• a second charged particle beam electrode arranged to face the first charged particle beam electrode and having a circular hole-shaped opening;
• an electrode holder that holds the first charged particle beam electrode and the second charged particle beam electrode;
• an electrode power supply that applies a voltage between the first charged particle beam electrode and the second charged particle beam electrode;
• an electrode position adjusting mechanism that moves the electrode holder on a plane stretched by a first axis and a second axis orthogonal to the first axis;
• and
• an electrode tilting mechanism that adjusts an incident angle of the charged particle beam to the first charged particle beam electrode.

A charged particle beam device comprising:

• a charged particle beam source that generates a charged particle beam;
• a first charged particle beam aperture having an annular slit;
• an aperture holder that holds the first charged particle beam aperture;
• an aperture position adjusting mechanism that moves the aperture holder on a plane stretched by a first axis and a second axis orthogonal to the first axis;
• and
• a first deflector group that deflects the charged particle beam incident on the first charged particle beam aperture, wherein
• an incident angle on the first charged particle beam aperture is adjusted by deflecting the charged particle beam with the first deflector group.

A charged particle beam device comprising:

• a charged particle beam source that generates a charged particle beam;
• a first charged particle beam electrode having an annular slit;
• a second charged particle beam electrode arranged to face the first charged particle beam electrode and having a circular hole-shaped opening;
• an electrode holder that holds the first charged particle beam electrode and the second charged particle beam electrode;
• an electrode power supply that applies a voltage between the first charged particle beam electrode and the second charged particle beam electrode;
• an electrode position adjusting mechanism that moves the electrode holder on a plane stretched by a first axis and a second axis orthogonal to the first axis;
• and
• a first deflector group that deflects the charged particle beam incident to the first charged particle beam electrode, wherein
• an incident angle on the first charged particle beam electrode is adjusted by deflecting the charged particle beam with the first deflector group.