EUV lithography apparatus
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsCheng Hung Tsai, Sheng-Kang Yu, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jui Chen
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Abstract
An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.
Claims20
An extreme ultra violet (EUV) light source apparatus, comprising:
- a collector mirror;
- an excitation laser inlet port configured to receive an excitation laser;
- a first mirror configured to reflect the excitation laser that passes through a zone of excitation;
- and
- a second mirror configured to reflect the excitation laser reflected by the first mirror.
An extreme ultra violet (EUV) light source apparatus, comprising:
- a collector mirror;
- an excitation laser inlet port configured to receive an excitation laser;
- a first mirror configured to reflect the excitation laser that passes through a zone of excitation;
- a second mirror configured to reflect the excitation laser reflected by the first mirror;
- and
- a third mirror configured to reflect the excitation laser reflected by the second mirror.
An extreme ultra violet (EUV) light source apparatus, comprising:
- a collector mirror;
- an excitation laser inlet port configured to receive an excitation laser;
- and
- a first mirror configured to reflect the excitation laser that passes through a zone of excitation toward a target location inside the EUV light source apparatus.
Dependencies are inferred from the claim text.