System and method for semiconductor topography simulations
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsNuo Xu, Zhengping Jiang, Ji-Ting Li, Yuan Hao Chang, Zhiqiang Wu, Wen-Hsing Hsieh
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsNuo Xu, Zhengping Jiang, Ji-Ting Li, Yuan Hao Chang, Zhiqiang Wu, Wen-Hsing Hsieh
Estimating the term…
The present disclosure provides a method for topography simulation of a physical structure under a topography-changing process. The method includes initializing a voxel mesh as a three-dimensional (3D) representation of the physical structure, generating a batch of particles, simulating a flight path of one of the particles with a ray-tracing method by a parallel processing thread in a hardware accelerator, identifying a surface normal of a voxel unit in the voxel mesh that intersects the flight path by the parallel processing thread, determining a surface reaction between the one of the particles and the voxel unit by a central processing unit (CPU), and updating the voxel mesh based on the determining of the surface reaction.
A method for topography simulation of a physical structure under a topography-changing process, comprising:
A method for performing a topography simulation on a hardware platform that includes a central processing unit (CPU) and a graphics processing unit (GPU), the method comprising:
A non-transitory computer-readable storage medium storing instructions that, when executed by a computer, cause the computer to perform a method for topography simulating on a physical structure, the method comprising:
Dependencies are inferred from the claim text.