Reticle detection apparatus, reticle detection method, exposure machine and photolithography device

Abstract

A reticle detection apparatus includes a processing unit, an optical detection unit, and an auxiliary detection unit; the optical detection unit is configured to determine whether there is a reticle according to the intensity of the received light; the processing unit is configured to start the auxiliary detection unit when the optical detection unit does not detect the reticle; the auxiliary detection unit is configured to detect whether there is a reticle based on the piezoelectric effect or the acoustoelectric effect; wherein, after the auxiliary detection unit is started, the processing unit is configured to serve the detection result of the auxiliary detection unit as a basis for determining whether there is a reticle.

Dependencies are inferred from the claim text.