Apparatus and method for cleaning a support structure in a lithographic system
AssigneeASML Holding N.V.
InventorKeane Michael Levy
Life of this patent
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Abstract
Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which abase supporting the substrate is provided with a surface profile so as to be thicker towards a middle portion of the base so that when a substrate supported by the base is pressed between the working surface and the base the contaminant is transferred from the working surface to the substrate.
Claims12
An apparatus for use in a system for generating radiation for photolithography, the apparatus comprising:
- a base arranged to support a substrate on a first surface of the base, the first surface being configured to have a surface profile that is higher at a middle portion of the first surface than at a laterally peripheral portion of the first surface;
- and
- a clamping structure configured to make contact with the substrate,
- wherein the clamping structure is configured to tilt with respect to the base, such that the clamping structure exerts a force on the substrate, and
- wherein an insert is disposed between the substrate and the base, at least one lateral surface of the insert having convex curvature.
An apparatus for use in a system for generating radiation for photolithography, the apparatus comprising:
- a substrate;
- a base arranged to support the substrate on a first surface of the base, the substrate being supported in a manner such that a middle portion of a top surface of the substrate extends vertically farther from the base than a peripheral portion of the substrate;
- and
- a clamping structure configured to make contact with the substrate,
- wherein the clamping structure is configured to tilt with respect to the base such that the clamping structure exerts a force on the substrate, and
- wherein an insert is disposed between the substrate and the base, at least one lateral surface of the insert having convex curvature.
Dependencies are inferred from the claim text.