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US 12,117,728 B2Granted
Resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorJun Hatakeyama
Life of this patent
Estimating the term…
Abstract
A resist composition is provided comprising a base polymer and a quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodine or bromine-substituted hydrocarbyl group (exclusive of iodine or bromine-substituted aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a compound having a 1,1,1,3,3,3-hexafluoro-2-propanol group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
Claims13
A resist composition comprising a base polymer and a quencher,
- said quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodine or bromine-substituted hydrocarbyl group, exclusive of iodine or bromine-substituted aromatic ring, bonded to the nitrogen atom via an ester bond-containing group and a compound having a 1,1,1,3,3,3-hexafluoro-2-propanol group.
Dependencies are inferred from the claim text.