Apparatus and method for generating extreme ultraviolet radiation
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Huan Chen, Yu-Chih Huang, Ming-Hsun Tsai, Shang-Chieh Chien, Heng-Hsin Liu
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Abstract
A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets.
Claims20
An extreme ultraviolet (EUV) radiation source comprising:
- an EUV generation chamber enclosing a space;
- and
- a droplet generator configured to generate target droplets of a given material, the droplet generator comprising a nozzle configured to supply the target droplets in the space, wherein:
- the nozzle comprises a nozzle having a structured nozzle pattern configured to provide an angular momentum to the target droplets.
A droplet generator configured to generate target droplets of a given material for an extreme ultraviolet (EUV) source, comprising:
- a structured nozzle tube having an inner surface comprising at least one of a groove or a projection,
- wherein the structured nozzle tube is made of quartz.
A method of producing target droplets for generating laser produced plasma in an extreme ultraviolet (EUV) radiation source, the method comprising:
- generating target droplets of a given material by a droplet generator,
- wherein an angular momentum is provided to the target droplets.
Dependencies are inferred from the claim text.