Integrated circuit device including a power supply line and method of forming the same

A semiconductor structure, comprising:

• a substrate;
• an isolation feature disposed over the substrate;
• a first semiconductor strip and a second semiconductor strip extending from the substrate and rising above the isolation feature;
• a metal line disposed over the isolation feature and between the first semiconductor strip and the second semiconductor strip;
• a first source/drain feature disposed over the first semiconductor strip;
• a second source/drain feature disposed over the second semiconductor strip;
• a fill fin disposed over the metal line and between the first source/drain feature and the second source/drain feature;
• and
• a contact feature disposed over the isolation feature and between the first semiconductor strip and the second semiconductor strip,
• wherein the contact feature comprises:
• a lateral component disposed over a top surface of the first source/drain feature, and
• a vertical component extending downward along a sidewall of the first source/drain feature to physically contact the top surface of the metal line,
• wherein a top surface of the isolation feature is higher than a bottom surface of the fill fin.

A semiconductor structure, comprising:

• a substrate;
• an isolation feature disposed over the substrate;
• a first fin and a second fin extending from the substrate and rising above the isolation feature, the first fin and the second fin being spaced apart along a direction;
• a metal line disposed over the isolation feature and spaced apart from the first fin and the second fin along the direction by the isolation feature;
• a first source/drain feature disposed over the first fin;
• a second source/drain feature disposed over the second fin;
• a contact feature in contact with a top surface of the first source/drain feature and a top surface of the metal line;
• and
• a first fill fin disposed over the metal line and between the first source/drain feature and the second source/drain feature along the direction.