Method of forming topology-controlled amorphous carbon polymer film

A method of top-selective deposition using an initially flowable carbon-based film on a substrate having a recess defined by a top surface, sidewall, and a bottom, comprising steps of:

• (i) depositing the initially flowable carbon-based film in the recess of the substrate in a reaction space, wherein the initially flowable carbon-based film accumulates within the recess, and then stopping the deposition step, wherein after deposition is stopped, the initially flowable carbon-based film forms a carbon-based film in the recess;
• (ii) exposing the carbon-based film in the recess to a nitrogen plasma in an atmosphere substantially devoid of hydrogen and oxygen so as to redeposit a portion of the carbon-based film in the recess, wherein the carbon-based film is redeposited selectively on the top surface to form a redeposited carbon-based film on the top surface, wherein the nitrogen plasma is anisotropic;
• and
• (iii) removing a portion of the carbon-based film remaining on the bottom of the recess by plasma ashing,
• wherein the plasma ashing does not remove all of the redeposited carbon-based film on the top surface;
• and
• repeating steps (i), (ii), and (iii) to form a top-selective deposited carbon-based film.