PECVD apparatus
AssigneeGuangzhou Aifo Light Communication Technology Company Ltd.
InventorsGuoqiang Li, Xinyan Yi
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AssigneeGuangzhou Aifo Light Communication Technology Company Ltd.
InventorsGuoqiang Li, Xinyan Yi
Estimating the term…
A PECVD apparatus includes a transfer chamber, a load lock, a cleaning chamber, a spin-drying chamber, a deposition chamber, and an unload lock; wherein the load lock, the cleaning chamber, the spin-drying chamber, the deposition chamber, and the unload lock are successively spirally arranged on a side wall of the transfer chamber; and a spiral conveyor device is arranged in the transfer chamber, wherein the spiral conveyor device includes a conveyor rod, a spiral drive mechanism, and a plurality of conveyor assemblies; wherein the conveyor rod is vertically arranged in the transfer chamber, and the plurality of conveyor assemblies are spirally arranged on the conveyor rod, and wherein the spiral drive mechanism is configured to drive the conveyor rod to undergo a spiral ascending or descending movement.
A plasma enhanced chemical vapor deposition (PECVD) apparatus, comprising:
Dependencies are inferred from the claim text.