Substrate stage and substrate processing system using the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Huan Chen, Yu-Chih Huang, Ya-An Peng, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
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Abstract
A semiconductor substrate stage for carrying a substrate is provided. The semiconductor substrate stage includes a base layer, a magnetic shielding layer disposed on the base layer, a carrier layer disposed on the magnetic shielding layer, a receiver disposed on the carrier layer, a storage layer disposed between the base layer and the magnetic shielding layer, and a magnetic shielding element disposed on the carrier layer and surrounding the receiver.
Claims20
A semiconductor substrate stage for carrying a substrate, comprising:
- a base layer;
- a magnetic shielding layer disposed on the base layer;
- a carrier layer disposed on the magnetic shielding layer;
- a receiver disposed on the carrier layer;
- a storage layer disposed between the base layer and the magnetic shielding layer;
- and
- a magnetic shielding element disposed on the carrier layer and surrounding the receiver.
A semiconductor substrate stage for carrying a substrate, comprising:
- a base layer having a channel;
- a magnetic shielding layer disposed on the base layer;
- a carrier layer disposed on the magnetic shielding layer;
- a receiver disposed on the carrier layer, wherein the receiver is configured to receive a signal that controls the movement of the semiconductor substrate stage;
- and
- a storage layer disposed between the base layer and the magnetic shielding layer, comprising a water storage device partially exposed from the channel.
A semiconductor substrate stage for carrying a substrate, comprising:
- a base layer, wherein a channel is formed on the base layer;
- a magnetic shielding layer disposed on the base layer, comprising an insulating layer and a metal layer, wherein sidewalls of the metal layer are in contact with the insulating layer;
- a carrier layer disposed on the magnetic shielding layer;
- a receiver disposed in a recess formed on a top surface of the carrier layer;
- and
- a storage layer exposed from the channel.
Dependencies are inferred from the claim text.