Resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorTakuya Ikeda
Life of this patent
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Abstract
A resist composition containing a polymeric compound having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1). In the formula, W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, Xt represents a group that forms a monocyclic or polycyclic hydrocarbon group together with Ct, provided that part or all of hydrogen atoms contained in this monocyclic or polycyclic hydrocarbon group may be substituted with a substituent, and part of carbon atoms constituting a ring may be substituted with a hetero atom, and Ra01 represents a linear, branched, or cyclic aliphatic hydrocarbon group
Claims7
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
- a resin component (A1) which exhibits changed solubility in a developing solution under action of acid,
- wherein the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a0-1):
- wherein W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, Xt represents a group that forms a monocyclic or polycyclic hydrocarbon group together with Ct, provided that part or all of hydrogen atoms contained in the monocyclic or polycyclic hydrocarbon group may be substituted with a substituent, and part of carbon atoms constituting a ring may be substituted with a hetero atom, and Ra01 represents a linear, branched, or cyclic aliphatic hydrocarbon group.
Dependencies are inferred from the claim text.