Methods of greytone imprint lithography to fabricate optical devices

A method of imprinting a pattern on a substrate, the method comprising:

• forming a first pattern on a plurality of die on each of a plurality of masters, the first pattern on each die including a plurality of patterned features;
• measuring the patterned features at a plurality of locations on each die on each of the masters;
• selecting a first die on a first master of the plurality of masters based on the measurements of the patterned features on each die of each of the masters;
• and
• using the first die on the first master to form a second pattern on an imprint template.

A method of imprinting a pattern on a substrate, the method comprising:

• forming a first pattern on a plurality of die on each of a plurality of masters using a method other than imprinting, the first pattern on each die including a plurality of patterned features;
• measuring the patterned features at a plurality of locations on each die on each of the masters;
• selecting a first die on a first master of the plurality of masters based on the measurements of the patterned features on each die of each of the masters;
• using the first die on the first master to form a second pattern on a first imprint template;
• imprinting the first pattern on each die of a plurality of die of a new master with the first imprint template;
• and
• using the plurality of die on the new master to form the second pattern on each die of a plurality of die on a second imprint template.