Susceptor arrangement of a CVD reactor

A susceptor arrangement, comprising:

• a substrate holder (4);
• at least one covering element (5, 15) comprising a lowermost covering plate (6, 16, 36) and an uppermost covering plate (7, 17);
• a circular or annular susceptor (2) with a first broad side surface (3), on which the substrate holder (4) and the at least one covering element (5, 15) are arranged, wherein the lowermost covering plate (6, 16, 36) adjoins the first broad side surface (3) of the susceptor (2), and wherein the covering element (5, 15) forms a plate stack in which the uppermost covering plate (7, 17) lies completely on the lowermost covering plate (6, 16, 36) and forms a free broad side surface (14) of the susceptor arrangement;
• and
• at least one positioning element (8, 18) inserted through both a respective opening (12, 13) of the lowermost covering plate (6, 16, 36) and through or into a respective opening (9, 10, 19) of the uppermost covering plate (7, 17), with which the uppermost covering plate (7, 17) is secured to the lowermost covering plate (6, 16, 36).