Processing liquid nozzle and cleaning apparatus
AssigneeTokyo Electron Limited
InventorsDaisuke Goto, Katsuhiro Morikawa, Takahiro Koga
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorsDaisuke Goto, Katsuhiro Morikawa, Takahiro Koga
Estimating the term…
A processing liquid nozzle includes: an ultrasonic wave generator including a oscillator that generates ultrasonic waves and a oscillating body that is joined to the oscillator; a first supply flow path configured to supply a first liquid to a position in contact with the oscillating body of the ultrasonic wave generator; an ejection flow path configured to supply the first liquid to which the ultrasonic waves are applied by the ultrasonic wave generator to an ejection port; and a second supply flow path connected to the ejection flow path on a downstream side from the ultrasonic wave generator and configured to supply a second liquid to the ejection flow path.
A processing liquid nozzle comprising:
Dependencies are inferred from the claim text.