Resistive material, method of manufacturing resistive material, and resistor for detecting electric current
AssigneeKoa Corporation
InventorsReina Kaneko, Yoshitaka Kumeda, Tadahiko Yoshioka
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Abstract
The resistive material contains copper and manganese, an oxide film of manganese being formed on a surface of the resistive material.
Claims7
A resistive material containing copper and manganese, an oxide film of manganese being formed on a surface of the resistive material, wherein
- a thickness of the oxide film is 70 nm or more, and
- the thickness of the oxide film is 1% or less with respect to a total thickness of the resistive material.
A method of manufacturing a resistive material comprising, applying heat treatment to a resistive material containing copper and manganese at a temperature of 490° C. or above and 750° C. or below for 10 minutes or more and 60 minutes or less in an atmosphere where oxygen concentration is 5 ppm or more and 30 ppm or less.
A resistor for detecting an electric current, the resistor comprising a resistive element formed of a resistive material containing copper and manganese, an oxide film of manganese being formed on a surface of the resistive material, wherein
- a thickness of the oxide film is 70 nm or more, and
- the thickness of the oxide film is 1% or less with respect to a total thickness of the resistive material.
Dependencies are inferred from the claim text.