Substrate treating system and substrate transporting method

A substrate treating system for treating substrates, comprising:

• an indexer block where a carrier platform for placing a carrier capable of accommodating substrates is provided;
• a first treating device;
• and
• a second treating device, wherein
• the first treating device, the indexer block, and the second treating device are linearly connected in this order in a horizontal direction,
• the indexer block includes a substrate buffer for placing the substrates, the substrate buffer being disposed in the middle of the first treating device and the second treating device,
• the first treating device includes a first treating block and an interface block, the first treating block being connected to the indexer block and performing a first treatment on one of the substrates, the interface block being connected to the first treating block and being configured to load and unload the one of substrates into and from an external device,
• the indexer block takes the one of substrates from the carrier placed on the carrier platform, and transports the taken one of the substrates to the substrate buffer,
• the first treating block receives the one of the substrates from the substrate buffer, performs the first treatment on the received one of the substrates, and transports the one of the substrates subjected to the first treatment to the interface block,
• the interface block unloads the one of the substrates transported by the first treating block to the external device, and loads the one of the substrates treated into the external device, and
• the first treating block receives the one of the substrates treated in the external device from the interface block, and transports the received one of the substrates to the substrate buffer,
• the second treating device receives the one of the substrates, transported to the substrate buffer by the first treating device, from the substrate buffer, performs a predetermined treatment on the received one of the substrates, and transports the one of the substrates treated in the second treating device to the substrate buffer, and
• the indexer block returns the one of the substrates treated in the second treating device from the substrate buffer to the carrier placed on the carrier platform.

A substrate treating system for treating substrates, comprising:

• an indexer block where a carrier platform for placing a carrier capable of accommodating substrates is provided;
• a first treating device;
• and
• a second treating device, wherein
• the first treating device, the indexer block, and the second treating device are linearly connected in this order in a horizontal direction,
• the indexer block includes a substrate buffer for placing the substrates, the substrate buffer being disposed in the middle of the first treating device and the second treating device,
• the first treating device includes a first treating block connected to the indexer block, and an interface block connected to the first treating block, the interface block being configured to load and unload one of the substrates into and from an external device,
• the first treating block includes a first treatment layer configured to perform a first treatment on the one of the substrates, and a third treatment layer configured to perform a third treatment in a level different from a level of the first treatment layer,
• the indexer block takes one of the substrates from the carrier placed on the carrier platform, and transports the taken one of the substrates to the substrate buffer such that the third treatment layer enables reception of the one of the substrates,
• the third treatment layer receives the one of the substrates from the substrate buffer, performs the third treatment on the received one of the substrates, and transports the one of the substrates, subjected to the third treatment, to the substrate buffer,
• the indexer block moves the one of the substrates, subjected to the third treatment, from the level of the third treatment layer to the level of the first treatment layer in the substrate buffer such that the first treatment layer enables reception of the one of the substrates,
• the first treatment layer receives the one of the substrates, subjected to the third treatment, from the substrate buffer, performs the first treatment on the received one of the substrates, and transports the one of the substrates subjected to the first treatment to the interface block,
• the interface block unloads the one of the substrates transported by the first treatment layer to the external device, and loads the one of the substrates treated into the external device,
• the first treatment layer receives the one of the substrates treated in the external device from the interface block, and transports the received one of the substrates to the substrate buffer, and
• the second treating device receives the one of the substrates, transported to the substrate buffer by the first treatment layer, from the substrate buffer, performs a predetermined treatment on the received one of the substrates, and transports the one of the substrates treated in the second treating device to the substrate buffer, and
• the indexer block returns the one of the substrates treated in the second treating device from the substrate buffer to the carrier placed on the carrier platform.