Apparatus and method for physical vapor deposition
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Young Wang, Wen-Cheng Yang, Chyi-Tsong Ni
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Abstract
An apparatus and method for physical vapor deposition includes a magnetron having a plurality of electromagnets disposed between a base and a magnetic conductive plate. The magnetron includes a plurality of individually controlled electromagnets between a base and an electromagnetic plate. The magnetron controls the polarity and strength of current supplied to the respective electromagnets to generate magnetic fields that confine electrons to areas near a target material within the deposition chamber.
Claims20
A magnetron for physical vapor deposition, comprising:
- a magnetic conductive plate defining a plurality of receptacles, wherein the magnetic conductive plate comprises magnetic conductive segments disposed within at least some receptacles of the plurality of receptacles;
- a base coupled to the magnetic conductive plate;
- and
- a plurality of electromagnets disposed between the magnetic conductive plate and the base in a first direction and spaced apart from the magnetic conductive plate in the first direction, wherein:
- the plurality of electromagnets are in direct contact with the base, and
- each electromagnet of the plurality of electromagnets comprises:
- a magnetic core;
- a coil surrounding the magnetic core, wherein the coil comprises a conductor;
- and
- an encapsulator encapsulating the magnetic core and the coil, wherein the encapsulator comprises a magnetic-isolated material.
A deposition device for physical vapor deposition, comprising:
- a housing defining a deposition chamber, wherein the housing comprises a side surface defining a gas port to introduce a gas into the deposition chamber;
- a holder disposed within the deposition chamber, wherein the holder comprises a surface;
- and
- a magnetron disposed within the deposition chamber, wherein the magnetron comprises:
- a magnetic conductive plate defining a plurality of receptacles, wherein the magnetic conductive plate comprises magnetic conductive segments disposed within at least some receptacles of the plurality of receptacles,
- a base, wherein the magnetic conductive plate is disposed between the base and the surface in a first direction, and
- a plurality of electromagnets in direct contact with the base, wherein the plurality of electromagnets are disposed between the magnetic conductive plate and the base in the first direction and spaced apart from the magnetic conductive plate, including the magnetic conductive segments, in the first direction,
- wherein each electromagnet of the plurality of electromagnets comprises:
- a magnetic core;
- a coil surrounding the magnetic core, wherein the coil comprises a conductor;
- and
- an encapsulator encapsulating the magnetic core and the coil, wherein the encapsulator comprises a magnetic-isolated material.
A deposition device for physical vapor deposition, comprising:
- a magnetron comprising:
- a magnetic conductive plate defining a plurality of receptacles, wherein the magnetic conductive plate comprises magnetic conductive segments disposed within at least some receptacles of the plurality of receptacles;
- and
- a plurality of electromagnets overlying the magnetic conductive segments in a first direction and spaced apart from the magnetic conductive plate, wherein the plurality of electromagnets are in direct contact with a base of the magnetron;
- and
- a holder for supporting a substrate, wherein the magnetic conductive segments are between the plurality of electromagnets and the holder in the first direction,
- wherein each electromagnet of the plurality of electromagnets comprises:
- a magnetic core;
- a coil surrounding the magnetic core, wherein the coil comprises a conductor;
- and
- an encapsulator encapsulating the magnetic core and the coil, wherein the encapsulator comprises a magnetic-isolated material.
Dependencies are inferred from the claim text.