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US 12,014,907 B2Granted
Method and device for forming graphene structure
AssigneeTokyo Electron Limited
InventorsRyota Ifuku, Takashi Matsumoto, Masahito Sugiura
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Abstract
A method of forming a graphene structure, includes: providing a substrate; performing a preprocessing by supplying a first processing gas including a carbon-containing gas to the substrate while heating the substrate, without using plasma; and after the preprocessing, forming the graphene structure on a surface of the substrate through a plasma CVD using plasma of a second processing gas including a carbon-containing gas.
Claims13
A method of forming a graphene structure, the method comprising:
- providing a substrate;
- performing a preprocessing by supplying a first processing gas including a carbon-containing gas to the substrate while heating the substrate, without using plasma;
- and
- after the preprocessing, forming the graphene structure on a surface of the substrate through a plasma chemical vapor deposition (CVD) using plasma of a second processing gas including a carbon-containing gas,
- wherein the carbon-containing gas included in the first processing gas is a hydrocarbon gas.
2 more elements
An apparatus for forming a graphene structure, comprising:
- a processing container in which a substrate is accommodated;
- a heating mechanism configured to heat the substrate;
- a planar slot antenna having a slot and provided on the processing container via a microwave transmission plate made of a dielectric material that constitutes a ceiling wall of the processing container;
- a microwave introduction mechanism configured to introduce microwaves into the processing container through the slot and the microwave transmission plate;
- a gas introduction mechanism configured to supply a processing gas including a carbon-containing gas and an oxidizing gas into the processing container;
- an exhaust mechanism configured to exhaust an interior of the processing container;
- and
- a controller configured to control the heating mechanism, the microwave introduction mechanism, the gas introduction mechanism, and the exhaust mechanism to execute:
- after the substrate is loaded into the processing container, performing a preprocessing by supplying a first processing gas including the carbon-containing gas to the substrate while heating the substrate, without using plasma;
- and
- after the preprocessing, forming the graphene structure on a surface of the substrate through a plasma CVD using plasma of a second processing gas including the carbon-containing gas,
- wherein the carbon-containing gas included in the first processing gas is a hydrocarbon gas.
9 more elements
Dependencies are inferred from the claim text.