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AssigneeApplied Materials, Inc.
InventorsJong Yun Kim, Kim Seong Sim, Roman M. Mostovoy, Won Ho Sung, Pei-Chia Chen
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Embodiments described herein relate to process systems for cleaning semiconductor process chamber components. The process systems include a process chamber having process chamber components. The process chamber components include a substrate support disposed within a chamber volume of the process chamber. A gas distribution assembly faces the substrate support. A gas baffle is fluidly coupled to the gas distribution assembly. A sensor system is coupled to the process chamber and is configured to monitor at least one characteristic of the volume of the process chamber. A dynamic gas assist is fluidly coupled to the gas baffle and is communicatively coupled to the sensor.
A system, comprising:
An apparatus for distributing cleaning gases to a process volume of a semiconductor process chamber, the apparatus comprising:
A method of cleaning semiconductor deposition chamber components, the method comprising:
Dependencies are inferred from the claim text.