Semiconductor devices and methods of fabricating the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHyun-Seung Song, Tae-Yeol Kim, Jae-Jik Baek
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AssigneeSamsung Electronics Co., Ltd.
InventorsHyun-Seung Song, Tae-Yeol Kim, Jae-Jik Baek
Estimating the term…
A semiconductor device is disclosed. The semiconductor device includes a gate electrode on a substrate and extending in a first direction, source/drain patterns spaced apart from each other, in a second direction, with the gate electrode interposed therebetween, a gate contact electrically connected to the gate electrode, and an active contact electrically connected to at least one of the source/drain patterns. The active contact includes a lower contact pattern electrically connected to the at least one of the source/drain patterns, the lower contact pattern having a first width in the first direction, and an upper contact pattern electrically connected to a top surface of the lower contact pattern, the upper contact pattern having a second width in the first direction that is smaller than the first width. The upper contact pattern and the gate contact horizontally overlap each other.
A method of fabricating a semiconductor device, the method comprising
A method of fabricating a semiconductor device, the method comprising
Dependencies are inferred from the claim text.