Substrate holder and methods of use
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Chi Tsai, Chueh-Chi Kuo
Life of this patent
Estimating the term…
Abstract
An electrostatic substrate holder for use in an extreme ultraviolet radiation lithography system includes a substrate receiving surface having a plurality of gas passages in fluid communication with a variable gas pressure pump. Varying the pressure in a void space between the backside of the substrate and the substrate receiving surface of the substrate holder promotes removal of non-gaseous materials within the void space between the backside of the substrate and the substrate receiving surface of the substrate holder.
Claims20
A method, comprising:
- in an extreme ultraviolet (EUV) lithography system, generating EUV radiation;
- reflecting the extreme ultraviolet radiation from a mask;
- receiving the extreme ultraviolet radiation, reflected by the mask, at a semiconductor substrate;
- supporting the semiconductor substrate by a substrate holder, the substrate holder including a plurality of burls and a plurality of fluid passages in fluid communication with a substrate receiving surface of the substrate holder and in fluid communication with a source of variable gas pressure;
- adjusting pressure within a void between a backside of the semiconductor substrate and the substrate receiving surface;
- passing a non-gaseous material from the void between a backside of the substrate and the substrate receiving surface through one or more of the plurality of fluid passages;
- and
- exposing material on the semiconductor substrate to the extreme ultraviolet radiation received at the semiconductor substrate.
A method, comprising:
- in an ultraviolet (UV) lithography system, generating UV radiation;
- reflecting the ultraviolet radiation from an ultraviolet radiation reflecting component of the ultraviolet lithography system;
- receiving the ultraviolet radiation, reflected by the ultraviolet radiation reflecting component, at a semiconductor substrate
- supporting the semiconductor substrate by a substrate holder, the substrate holder including a plurality of support surfaces and a plurality of fluid passages in fluid communication with a substrate receiving surface of the substrate holder and in fluid communication with a source of variable gas pressure;
- adjusting pressure within a void between a backside of the semiconductor substrate and the substrate receiving surface;
- and
- exposing material on the semiconductor substrate to the ultraviolet radiation received at the semiconductor substrate.
A substrate holder subsystem in an ultraviolet lithography system, the ultraviolet lithography system comprising:
- an ultraviolet radiation source;
- projection optics;
- and
- the substrate holder subsystem including:
- a support device;
- a source for providing a vacuum gas pressure;
- a substrate holder configured to couple a substrate to the support device, the substrate holder including a plurality of support surfaces in a plurality of circles that are arranged concentrically, and a plurality of fluid passages in fluid communication with a substrate receiving surface of the substrate holder and in fluid communication with the source for providing a vacuum gas pressure, the plurality of fluid passages being located between the plurality of support surfaces;
- and
- a pedestal coupled to the support device, the pedestal including a gas flow channel in fluid communication with one or more of the plurality of fluid passages and in fluid communication with the source for providing a vacuum gas pressure.
Dependencies are inferred from the claim text.