Lift pin assembly for a plasma processing apparatus

A plasma processing apparatus comprising:

• a processing chamber;
• an electrostatic chuck positioned within the processing chamber, the electrostatic chuck configured to support a workpiece;
• and
• a lift pin assembly comprising:
• a pin housing defining an opening into which a lift pin extends, the pin housing positioned such that the opening defined by the pin housing is aligned with an opening defined by the electrostatic chuck;
• a pin height adjustment member partially positioned within the opening defined by the pin housing, the pin height adjustment member movable along an axis in a first direction and a second direction, the pin height adjustment member movable in the first direction to move the lift pin into the opening defined by the electrostatic chuck to lift the workpiece off of the electrostatic chuck, the pin height adjustment member movable in the second direction to move the lift pin out of the opening defined by the electrostatic chuck to lower the workpiece onto the electrostatic chuck;
• and
• a pin holder assembly at least partially positioned within an opening defined by the pin height adjustment member, the pin holder assembly configured to hold the lift pin such that the lift pin is aligned with the opening defined by the electrostatic chuck, the pin holder assembly being configured to hold the lift pin such that the lift pin is rotatable about the axis.