Temperature control method and temperature control device

A temperature control device of a substrate processing apparatus,

• wherein the temperature control device executes a process including:
• (a) providing a substrate in a processing chamber of the substrate processing apparatus;
• (b) measuring a pre-processing temperature of an internal component of the processing chamber using a sensor;
• (c) determining a temperature control condition based on a difference between the pre-processing temperature measured in (b) and a target temperature that has been preset in advance;
• (d) performing a sub-processing including at least one of increasing the temperature of the internal component by a first plasma of a first processing gas and cooling the internal component by purging the processing chamber with a cooling gas, based on the temperature control condition, and
• (e) processing the substrate with a second plasma of a second processing gas.

A temperature control device of a substrate processing apparatus, the temperature control device comprising:

• a memory;
• and
• a CPU coupled to the memory and configured to:
• (a) provide a substrate in a processing chamber of the substrate processing apparatus;
• (b) measure a pre-processing temperature of an internal component of the processing chamber using a sensor;
• (c) determine a temperature control condition based on a difference between the pre-processing temperature measured in (b) and a target temperature that has been preset in advance;
• (d) perform a sub-processing including at least one of increasing the temperature of the internal component by a first plasma of a first processing gas and cooling the internal component by purging the processing chamber with a cooling gas, based on the temperature control condition, and
• (e) process the substrate with a second plasma of a second processing gas.