Charged particle beam writing apparatus
AssigneeNuFlare Technology, Inc.
InventorsHirofumi Morita, Takanao Touya
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Abstract
In one embodiment, a charged particle beam writing apparatus includes a positioning deflector adjusting an irradiation position of a charged particle beam radiated to a substrate which is a writing target, a fixed deflector which is disposed downstream of the positioning deflector in a traveling direction of the charged particle beam, and in which an amount of deflection is fixed, a focus correction lens performing focus correction on the charged particle beam according to a surface height of the substrate, and an object lens focusing the charged particle beam.
Claims13
A charged particle beam writing apparatus comprising:
- a positioning deflector adjusting an irradiation position of a charged particle beam radiated to a substrate which is a writing target;
- a fixed deflector which is disposed downstream of the positioning deflector in a traveling direction of the charged particle beam, and in which an amount of deflection is fixed;
- a focus correction lens performing focus correction on the charged particle beam according to a surface height of the substrate;
- and
- an object lens focusing the charged particle beam.
Dependencies are inferred from the claim text.