Burst statistics data aggregation filter
AssigneeCymer, Inc.
InventorsMatthew Minakais, Russell Allen Burdt
Life of this patent
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Abstract
A system includes a laser source configured to generate one or more bursts of laser pulses and a data collection and analysis system. The data collection and analysis system is configured to receive, from the laser source, data associated with the one or more bursts of laser pulses and determine, based on the received data, that the one or more bursts of laser pulses are for external use. The data collection and analysis system is further configured to determine, based on the received data, whether the one or more bursts of laser pulses are for an on-wafer operation or are for a calibration operation.
Claims25
A laser analysis system, comprising:
- a laser source configured to generate bursts of laser pulses;
- and
- a data collection and analysis system configured to:
- receive, from the laser source, respective data associated with the bursts of laser pulses;
- categorize, based on the received respective data, some of the bursts of laser pulses and/or the respective data associated therewith into an internal use category of pulses used within the laser source and some of the bursts of laser pulses and/or the respective data associated therewith into an external use category of pulses used outside the laser source;
- and
- categorize, based on the received respective data, some of the bursts of laser pulses and/or the respective data associated therewith in the external use category into an on-wafer operation category and some of the bursts of laser pulses and/or the respective data associated therewith in the external use category into a calibration operation category.
A method for analyzing data associated with a laser source, the method comprising:
- receiving, at a data collection and analysis system and from a laser source, respective data associated with bursts of laser pulses generated by the laser source;
- categorizing, by the data collection and analysis system and based on the received respective data, some of the bursts of laser pulses and/or the respective data associated therewith into an internal use category of pulses used within the laser source and some of the bursts of laser pulses and/or the respective data associated therewith into an external use category of pulses used outside the laser source;
- and
- categorizing, by the data collection and analysis system based on the received respective data, some bursts of laser pulses in the external use category and/or the respective data associated therewith into an on-wafer operation category and some bursts of laser pulses in the external use category and/or the respective data associated therewith into a calibration operation category.
A lithographic apparatus, comprising:
- an illumination system configured to condition a radiation beam;
- a projection system configured to project a pattern imparted to the radiation beam onto a substrate,
- wherein the illumination system comprises:
- a laser source configured to generate bursts of laser pulses;
- and
- a data collection and analysis system configured to:
- receive, from the laser source, respective data associated with the bursts of laser pulses;
- and
- categorize, based on the received respective data, some of the bursts of laser pulses and/or associated respective data into an internal use category for use within the laser source, some of the bursts of laser pulses and/or associated respective data into an on wafer operation category, and some of the bursts of laser pulses and/or associated respective data into a calibration operation category.
A non-transitory computer-readable medium storing instructions that, when executed by a processor, cause the processor to perform operations, the operations comprising:
- receiving, from a laser source, respective data associated with bursts of laser pulses generated by the laser source;
- and
- categorizing, based on the received respective data, some of the bursts of laser pulses and/or associated respective data into an internal use category for use within the laser source, some of the one or more bursts of laser pulses and/or associated respective data into an on wafer operation category, and some of the bursts of laser pulses and/or associated respective data into a calibration operation category.
Dependencies are inferred from the claim text.