Substrate measuring device and a method of using the same

A method for semiconductor processing, the method comprising:

• providing light at multiple wavelengths from a broad spectrum light source of an emitter;
• filtering the light at multiple wavelengths to produce multiple beams of light, each of at least some of the multiple beams of light having a different wavelength;
• passing the multiple beams of light through a polarizer;
• transmitting the multiple beams of light that have passed through the polarizer to a substrate, wherein the multiple beams of light are provided to the substrate via at least one optical fiber including multiple zones, each of the multiple zones including strands of optical fibers, a material of the strands of optical fibers of a zone being different from the material of the strands of optical fibers of a different zone;
• shielding the substrate from a portion of the multiple beams of light utilizing a metal shield on the emitter;
• collecting reflected light of the multiple beams of light at a receiver, the reflected light being reflected off of the substrate;
• mapping variations of height across the substrate based on the collected reflected light;
• determining a leveling position of the substrate relative to a focus plane based on the mapping;
• aligning the substrate at the leveling position;
• and
• performing a lithography exposure process on the substrate after aligning the substrate.

A method for semiconductor processing, the method comprising:

• emitting multiple beams of light from multiple light sources from an emitter to a substrate, wherein the multiple beams of light have different wavelengths;
• transmitting the multiple beams of light from the emitter to a substrate, wherein the multiple beams of light are provided to the substrate via at least one optical fiber including multiple zones, each of the multiple zones including strands of optical fibers, a material of the strands of optical fibers of a zone being different from the material of the strands of optical fibers of a different zone;
• collecting reflected light of the multiple beams of light at a receiver, the reflected light being reflected off of the substrate;
• determining a variation of height of the substrate based on the collected reflected light;
• and
• aligning the substrate with an optical focusing module in response to the determined variation of height of the substrate.