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US 12,007,688 B2Granted
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin
AssigneeFUJIFILM Corporation
InventorsDaisuke Asakawa, Akiyoshi Goto, Masafumi Kojima, Takashi Kawashima, Yasufumi Oishi, Keita Kato
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Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.
Claims20
An actinic ray-sensitive or radiation-sensitive resin composition comprising a resin including a repeating unit represented by General Formula (1) and capable of increasing a polarity by an action of an acid,
- in General Formula (1), X represents —SO2—, —SO—, or —CS—, Y represents a divalent linking group, R1 represents a monovalent organic group, and R2 to R5 each independently represent a hydrogen atom or a monovalent organic group.
A resin including a repeating unit represented by General Formula (1) and capable of increasing a polarity by an action of an acid,
- in General Formula (1), X represents —SO2—, —SO—, or —CS—, Y represents a divalent linking group, R1 represents a monovalent organic group, and R2 to R5 each independently represent a hydrogen atom or a monovalent organic group.
Dependencies are inferred from the claim text.