Method in a flow device for exhaust gas aftertreatment and the flow device

A flow device for exhaust gas aftertreatment, comprising

• a mixing chamber;
• a mixing tube that resides mostly in the mixing chamber and is obliquely supported to a peripheral wall of the mixing chamber;
• and
• a reactant doser mount for a reactant doser to dose reactant to the mixing tube;
• wherein
• the mixing tube has a peripheral exhaust gas entry configured to receive exhaust gas at reactant stream arriving from the doser, and a mixing tube output;
• and
• a swirl arrangement around the mixing tube, configured to form a rotating flow around the mixing tube output and to enhance exhaust gas flow through the mixing tube by forming some pressure around the mixing tube downstream from the peripheral exhaust gas entry,
• wherein the peripheral exhaust gas entry comprises one or more apertures in the mixing tube, the one or more apertures facing towards incoming exhaust gas and residing peripherally in a sector of at most 180 degrees about a longitudinal axis of the mixing tube.