Retrofittable dry media abatement reactor

A media canister comprising:

• a reaction chamber having an inlet configured to receive an emission stream from a semiconductor manufacturing process;
• a dry media disposed within the reaction chamber and configured to abate the emission stream therein, wherein the media canister is configured to abate the emission stream in response to an abatement fault in an abatement apparatus;
• a first conduit including a first end coupled to a bypass valve, and a second end having a manifold coupled to the inlet of the reaction chamber, wherein the bypass valve is configured to fluidly couple the emission stream to the media canister in response to the abatement fault;
• a second conduit coupled to an outlet of the reaction chamber;
• and
• a valve disposed along at least one of the first conduit and the second conduit, wherein the valve is configured to adjust the emission stream flow rate through at least one of the first conduit and the second conduit.