Memory device having a diagonally opposite gate pair per memory cell
AssigneeMicron Technology, Inc.
InventorsGiorgio Servalli, Marcello Mariani, Antonino Rigano, Marcello Calabrese
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AssigneeMicron Technology, Inc.
InventorsGiorgio Servalli, Marcello Mariani, Antonino Rigano, Marcello Calabrese
Estimating the term…
Implementations described herein relate to various structures, integrated assemblies, and memory devices. In some implementations, an integrated assembly includes a pillar having an upper source/drain, a middle source/drain, a lower source/drain, an upper channel between the upper source/drain and the middle source/drain, and a lower channel between the middle source/drain and the lower source/drain. The integrated assembly includes a gate pair that includes a first gate and a second gate. The first gate is positioned on a first side of the pillar at a first height, and the second gate is positioned on a second side of the pillar, that is opposite the first side, at a second height that is different from the first height. The integrated assembly includes a capacitor that is electrically coupled with the upper source/drain. Some implementations include methods of forming the various structures, integrated assemblies, and memory devices.
An integrated assembly, comprising:
An integrated assembly, comprising:
A memory device, comprising:
A method, comprising:
Dependencies are inferred from the claim text.