Devices including channel materials and passivation materials
AssigneeMicron Technology, Inc.
InventorsKamal M. Karda, Haitao Liu
Life of this patent
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AssigneeMicron Technology, Inc.
InventorsKamal M. Karda, Haitao Liu
Estimating the term…
A microelectronic device comprises a conductive line and a transistor adjacent to the conductive line. The transistor comprises a channel material extending into the conductive line, the channel material contacting the conductive line in three dimensions, a dielectric material adjacent to the channel material, a conductive material adjacent to the dielectric material, and a passivation material adjacent to the channel material. The microelectronic device further comprises a conductive contact adjacent to the channel material, the conductive contact including a portion extending between opposing portions of the channel material. Related microelectronic devices, electronic devices, and related methods are also disclosed.
A device, comprising:
A device, comprising:
A device, comprising:
Dependencies are inferred from the claim text.