Interconnect features with sharp corners and method forming same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorTze-Liang Lee
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorTze-Liang Lee
Estimating the term…
A method includes depositing a dielectric layer, depositing a plurality of mandrel strips over the dielectric layer, and forming a plurality of spacers on sidewalls of the plurality of mandrel strips to form a plurality of mask groups. Each of the plurality of mandrel strips and two of the plurality of spacers form a mask group in the plurality of mask groups. The method further includes forming a mask strip connecting two neighboring mask groups in the plurality of mask groups, using the plurality of mask groups and the mask strip collectively as an etching mask to etch the dielectric layer and to form trenches in the dielectric layer, and filling a conductive material into the trenches to form a plurality of conductive features.
A method comprising:
A method comprising:
A method comprising:
Dependencies are inferred from the claim text.