Multi-layer plasma resistant coating by atomic layer deposition

An article comprising:

• a body;
• and
• a plasma resistant coating on a surface of at least a portion of the body, wherein the plasma resistant coating comprises:
• a stress relief layer having a thickness of about 10 nm to about 1.5 μm;
• and
• a stack of alternating layers of a rare earth metal-containing oxide and a second oxide, the stack of alternating layers comprising:
• a plurality of layers of the rare earth metal-containing oxide each having a thickness of about 1 angstrom to about 100 angstroms and having a polycrystalline or amorphous structure;
• and
• a plurality of layers of the second oxide each having a thickness of about 0.5 angstroms to about 4 angstroms,
• wherein the rare earth metal-containing oxide naturally occurs in a crystalline structure, wherein the plurality of layers of the second oxide cause the plurality of layers of the rare earth metal-containing oxide to have the polycrystalline or amorphous structure rather than the crystalline structure, and wherein a thickness ratio of the plurality of layers of the rare earth metal-containing oxide to the plurality of layers of the second oxide is 2:1 to 25:1.