Component for use in a lithographic apparatus, method of protecting a component and method of protecting tables in a lithographic apparatus

A method comprising:

• providing a protective reticle cover or reticle that is shaped to protect at least part of a component of a lithographic apparatus, the protective reticle cover or the reticle having a contact surface that is arranged to adhere to at least part of the component;
• and
• bringing the protective reticle cover or the reticle into proximity with the component so as to cause the contact surface to adhere to the component and remain adhered without the application of external force,
• wherein the component is a support structure comprising a main body having a main body surface and a plurality of burls projecting from the main body surface and each having a distal end surface configured to engage with the protective reticle cover or the reticle, and wherein the protective reticle cover is arranged to cover the burls, and
• wherein the protective reticle cover or the reticle has a coating comprising a plurality of thin-film electrets to form an attractive force between the component and the protective reticle cover or the reticle.